Rare Earth Polishing Powder & Rare Earth Polishing Slurry Manufacturer
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High QualitySolid Rare Cerium Acetate Hydrate Powder For Catalyst
Cerium Acetate Molecular Formula: Ce(AC)₃·xH₂O Appearance: Cerium acetate is a white snowflake-like solid Application: Used as a raw material for other cerium salts and cerium oxide, as well as petroleum additives, etc. Item Specification Testing Standard Item Ce(AC) 3 -3N5 Ce(AC) 3 -4N Ce(AC) 3 -4N5 Ce(AC) 3 -5N TREO(wt%) ≥45 ≥45 ≥45 ≥45 Rare Earth Relative Purity (wt%) La 2 O 3 /TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO 2 /TREO ≥99.95 ≥99.99 ≥99.995 ≥99.999 Pr 6 O
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Competitive Price Lanthanum Cerium Carbonate in big size
Large particle size Lanthanum Cerium Carbonate Molecular Formula: (LaCe)₂(CO₃)₃ Appearance: Coarse particle lanthanum cerium carbonate is a white powder Application: Used for the production of rare earth polishing powder. Item Specification Testing Standard Item (LaCe) 2 (CO 3 ) 3 -65CeB1 (LaCe) 2 (CO 3 ) 3 -65CeB2 TREO(wt%) ≥45.0 ≥45.0 Lanthanum-Cerium Distribution and Rare Earth Impurities (wt%) La 2 O 3 /TREO 35±2 35±2 GB/T 18115.1 CeO 2 /TREO 65±2 65±2 Pr 6 O 11 /TREO ≤0
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Ultra-Low Defect Cerium Oxide CMP Slurry For Semiconductor Silicon Wafer Manufacturing
Ultra-Low Defect Cerium Oxide CMP Slurry For Semiconductor Silicon Wafer Manufacturing Product Overview Our ultra-low defect cerium oxide CMP slurry is designed to meet the stringent requirements of next-generation semiconductor fabrication. The slurry delivers precise chemical-mechanical interaction between abrasive particles and silicon surfaces, enabling atomic-scale planarization required for advanced nodes and high-performance devices. Engineered for compatibility with
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Advanced Ceria CMP Slurry For Silicon Wafer Polishing And Semiconductor Surface Planarization
Advanced Ceria CMP Slurry For Silicon Wafer Polishing And Semiconductor Surface Planarization Product Overview This advanced ceria-based CMP slurry is optimized for high-precision silicon wafer polishing where nanoscale surface control is required. The chemically active cerium oxide particles promote efficient material removal while preserving crystal integrity and minimizing subsurface damage. The slurry enables improved wafer flatness, reduced dishing and erosion effects,
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High-Purity Cerium Oxide CMP Slurry For Silicon Wafer Planarization & Semiconductor Manufacturing
High-Purity Cerium Oxide CMP Slurry For Silicon Wafer Planarization & Semiconductor Manufacturing Product Overview Our cerium oxide CMP polishing slurry is engineered for ultra-precision planarization of silicon wafers used in advanced semiconductor manufacturing. The slurry combines controlled mechanical abrasion with optimized chemical activity to achieve excellent surface flatness, low defectivity, and superior wafer surface integrity. Designed for modern CMP processes,
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Competitive Price Rare Earth Material Cerium Carbonate White Powder
Cerium Carbonate Molecular Formula: Ce₂(CO₃)₃ Appearance: Cerium carbonate is a white powder Application: Used in the manufacture of automobile exhaust purifiers, and also as an intermediate for producing metallic cerium, cerium oxide and other cerium compounds. Item Specification Testing Standard Item Ce 2 (CO 3 ) 3 -3N5B Ce 2 (CO 3 ) 3 -4NB Ce 2 (CO 3 ) 3 -4N5B Ce 2 (CO 3 ) 3 -5NB TREO(wt%) 45～50 45～50 45～50 45～50 Rare Earth Relative Purity (wt%) La 2 O 3 /TREO ≤0.01 ≤0.005
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High Qualtiy &Heavy Rare Earth Product Lanthanum Carbonate White Powdery Substance 50kg
Lanthanum Carbonate Molecular Formula: La₂(CO₃)₃ Appearance: Lanthanum carbonate is a white powdery substance Application: Mainly used as an intermediate compound of lanthanum Item Specification Testing Standard Item La 2 ( CO 3 ) 3 -3N5B La 2 ( CO 3 ) 3 -4N5B La 2 ( CO 3 ) 3 -5NB TREO(wt%) ≥45.0 ≥45.0 ≥45.0 Rare Earth Relative Purity (wt%) La 2 O 3 /TREO ≥99.95 ≥99.995 ≥99.999 GB/T 18115.1 CeO 2 /TREO ≤0.01 ≤0.003 ≤0.0005 Pr 6 O 11 /TREO ≤0.01 ≤0.0005 ≤0.0002 Nd 2 O 3 /TREO
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COMPETITIVE FACTORY PRICE 99.9% PURITY PRND RARE EARTH PRASEODYMIUM NEODYMIUM METAL
FACTORY PRICE 99.9% PURITY PRND RARE EARTH PRASEODYMIUM NEODYMIUM METAL Praseodymium-Neodymium Metal Chemical Formula: Pr+NdApplication: Main raw material for producing high-performance NdFeB permanent magnetic materials Item Specification PrNd-80NdA PrNd-80NdB PrNd-75NdA PrNd-75NdB Test Basis TRE (wt%) ≥99 ≥99 ≥99 ≥99 Rare Earth Relative Distribution & Purity (wt%) Pr+Nd/TREM ≥99.5 ≥99.9 ≥99.5 ≥99.9 GB/T 26417 Pr/TREM 20±2 20±2 25±2 25±2 GB/T 26417 Nd/TREM 80±2 80±2 75±2 75
BAOTOU LICHEN TECH. LTD., established in May 2018, is a specialized enterprise focused on the research, manufacturing, and sale of rare earth material
About Us
Rare earth polishing slurry, often featuring cerium oxide ((CeO_{2})) as its primary component, is an advanced, high-performance abrasive used for ultra-precision polishing of glass, optical lenses, LCD screens, and semiconductor wafers (CMP). These slurries provide high removal rates, superior ...
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Rare earth polishing powder, often termed the "king of polishing powders," is a high-performance abrasive based on cerium oxide ((CeO_{2})), designed for ultra-precision polishing of glass, optics, and semiconductor materials. It ensures exceptionally smooth, damage-free surfaces with high speed and ...
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